介紹
The MagPure Plasmid purification system uses the paramagnetic bead technology for high-throughput preparation of high-copy or low-copy 質粒DNA from E. coli cells. This kit also can be used with fosmid and BAC vector-based constructs. The system uses alkaline lysis followed by a MagPure purification to differentially bind plasmid DNA to paramagnetic beads. While the DNA is bound to the beads, contaminants can be rinsed away using a simple washing procedure. Because MagPure uses magnetic separation technology, the protocol does not require vacuum filtration. This makes kit extremely amenable to automation. Plasmid DNA purified with this system is most commonly used in Sanger Sequencing and 聚合酶鍊式反應 amplification.
細節
規格
| 特徵 | 規格 |
| 主要功能 | Isolation up to 15μg endotoxin free plasmid DNA from 1-5ml bacterial culture |
| 應用領域 | 酶消化, 定序, PCR and labeling, ETC. |
| 淨化技術 | 磁珠技術 |
| 工藝方法 | 手動或自動 |
| 樣品類型 | 常規質粒, plasmid≤30KB |
| 樣品量 | 1-5毫升 |
| 洗脫體積 | ≥50μl |
| 每次運行時間 | ≤80 minutes |
原則
該產品基於高結合磁顆粒的純化方法. The sample is lysed and digested under the action of lysate and Lysozyme. DNA 釋放到裂解液中. 加入磁性顆粒和結合溶液後, DNA將吸附在磁顆粒的表面上, 蛋白質等雜質不會被吸附而被去除. 用洗滌溶液洗滌吸附的顆粒以去除蛋白質和雜質, 用乙醇洗滌以除去鹽, 最後, 用洗脫緩衝液洗脫DNA.
優點
- 高純度 – 純化的質粒可以直接用於測序, enzyme digestion PCR, ETC.
- 快速地 – 它只需要 80 minutes to complete the isolation
- 高產 – up to 15μg plasmid can be bound in one column
- Economic – excellent cost-effectiveness performance
套件內容
| 內容 | P181402 | P181403 | P181404 |
| 淨化時間 | 100 準備工作 | 500 準備工作 | 5000 準備工作 |
| 核糖核酸酶A | 10 毫克 | 30 毫克 | 2 X 160 毫克 |
| 緩衝液P1 | 30 毫升 | 150 毫升 | 2 X 800 毫升 |
| 緩衝液P2 | 30 毫升 | 150 毫升 | 2 X 800 毫升 |
| Buffer LEN3 | 20 毫升 | 80 毫升 | 800 毫升 |
| Buffer LN4 | 90 毫升 | 400 毫升 | 4 X 980 毫升 |
| MagPure 顆粒 | 3.5 毫升 | 17 毫升 | 3 X 60 毫升 |
儲存和穩定性
RNase A and MagPure Particles should be stored at 2–8°C upon arrival. 然而, 短期儲存 (取決於 12 週) 在室溫下 (15–25°C) 不影響其性能. 其餘套件組件可在室溫下乾燥保存 (15–25°C) 並且至少穩定 18 在這些條件下幾個月. 整個套件可以存儲在2–8°C下, 但是在這種情況下, 緩衝區應在使用前重新溶解. 使用時確保所有緩衝液均處於室溫. 如果緩衝液中形成任何沉澱物, 37℃溫熱溶解. After the addition of RNase A, 緩衝液P1穩定 6 months when stored at
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